US2006234469(MICRON TECHNOLOGY INC)
[0055] FIG. 16 illustrates wafer fragment 10a after such subsequent processing. Specifically, FIG. 16 shows wafer fragment 10a after isolation regions 46 have been formed within openings 40 (FIG. 15), and after a polysilicon layer 38 is provided over the isolation regions. As shown, steps 42 define an outer lateral periphery of isolation regions 46. Such outer periphery is further outward than an outward periphery 33 of isolation regions 30 of FIG. 12. Such has resulted in the alleviation (shown as elimination) of dips 32 (FIG. 12) of the prior art isolation regions.
US9863498(BRP US INC [US])
[0012] In a further aspect, a portion of the flywheel is disposed further outward than the channel in the radial direction.
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[0114] With reference to FIGS. 5, 6, 10 and 12, the outer wall 58 c of the circumferentially extending channel 58 is disposed radially inwardly of the outer ring 312 and radially inwardly compared to the annular weight 316 of the flywheel 54 . The inner wall 58 b of the channel 58 is disposed radially inwardly compared to the inner ring 314 of the flywheel 54 . The channel 58 disposed radially outwardly of the gaps 310 between the flywheel spokes 306 . The channel 58 is disposed so as to receive air flowing past the stator coils 320 when the flywheel 54 is rotating.
US2021338525(SYSPAL HOLDINGS LTD [GB])
[0083] The second strip 122 has an outwardly-directed bend which extends further outward than the bend of the first strip 120 . The portion of the second strip 122 extending upwards from its outward bend therefore forms an outermost surface of the lower portion 120 . The threaded holes 107 are provided through this outermost surface.
