"a to be processed object"のネイティブ例は少ない。
US7586492(NVIDIA CORP [US])
[0009] Embodiments of the present invention provide graphics processors in which a rendering object and a post-processing object share access to a host processor with a programmable execution core. The rendering object operates to generate fragment data for an image from geometry data and to write the fragment data to an image buffer.
US8008639(ZEISS CARL NTS GMBH [DE])
[0007] According to an embodiment of the present invention a system for processing an object is provided comprising a gas supply apparatus for supplying gas to the object; a beam source for generating at least one activation beam for activating the gas; and a beam optics for directing the at least one activation beam to the object. Thereby, the gas supply apparatus comprises a stack of a plurality of plates being adjoined with their flat sides extending transverse to a beam direction of the activation beam, wherein the stack of plates allows a traversal of the activation beam towards the object and wherein the stack of plates comprises at least one gas inlet and at least one gas outlet which gas outlet is arranged in a flat side of a plate of the stack arranged closest to the to be processed object. The flat side thereby may substantially be plane or, in other embodiments, may be structured at its surface by protruding or recessing portions.
US11452430(BSH HAUSGERAETE GMBH [DE])
[0005] The present invention relates to a household appliance, including: at least one chamber for accommodating a to-be-processed object and at least one door for closing the chamber; a collection module, at least for collecting a time signal when the door is opened; a controller, connected to the collection module to receive and analyze the time signal generated by the collection module when the door is opened, count a high-frequency time segment and/or a low-frequency time segment when the door is opened in a predetermined time period, and generate a control signal for controlling an operation state at a function loading module; and the function loading module, connected to the controller to receive the control signal for controlling operation of the function loading module.
US2020118828(IBM [US])
[0002] In a semiconductor process, in order to secure depth of focus (DOF) of lithography, it is desired that the surface of a to-be-processed object has high flatness. Although there is a chemical mechanical polishing (CMP) technology as a processing technology for planarization, polishing damage (e.g., scratches) caused by abrasive grains (e.g., physical polishing agent) in a slurry to be used provides a cause for yield reduction.
"Detailed views of objects can have different default settings depending on the document type, for example, clicking a number in the To be Processed column will take you to the monitor with New andBlocked documents set as default. Last Export Date in the detailed view of a successful object shows when the last export took place. In the detailed view of a To be Processed object, in the Next Export Date column you see the future date for an export to the Concur system and in the column Last Successful Export Date you can find the last attempted successful export." (
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